Kwang Ik Moon

Title: Kwang Ik Moon: Innovator in Chemical Mechanical Polishing

Introduction

Kwang Ik Moon, an influential inventor based in Daejeon, South Korea, is renowned for his contributions to the field of chemical engineering. With a total of three patents to his name, he has made significant advancements in the area of chemical mechanical polishing (CMP).

Latest Patents

Kwang Ik Moon's latest patents focus on an adjuvant for controlling polishing selectivity and a chemical mechanical polishing slurry that incorporates this adjuvant. The first patent discloses an adjuvant designed for simultaneous polishing of cationically and anionically charged materials. This innovative solution features a polyelectrolyte salt that includes a linear polyelectrolyte, with a weight average molecular weight between 2,000 and 50,000, blended with a graft type polyelectrolyte that has a weight average molecular weight of 1,000 to 20,000. This combination results in enhanced polishing selectivity compared to traditional CMP slurries. Additionally, an innovative chemical mechanical polishing slurry comprised of this adjuvant and abrasive particles provides further improvements in polishing efficiency.

Career Highlights

Kwang Ik Moon works at LG Chem, Ltd., where he has been instrumental in developing cutting-edge technologies in the CMP industry. His research and practical applications have significantly influenced the performance and effectiveness of CMP processes. His expertise in the field has positioned him as a valuable asset within the company.

Collaborations

Throughout his career, Kwang Ik Moon has collaborated with talented professionals, including Gi Ra Yi and Jong Pil Kim. These partnerships have allowed for a rich exchange of ideas and innovations, further contributing to the successful advancements in chemical mechanical polishing technology.

Conclusion

Kwang Ik Moon's work exemplifies the spirit of innovation that drives the field of chemical engineering forward. His patents not only enhance the efficiency of chemical mechanical polishing processes but also reflect the dedication he has towards advancing technology in this domain. As he continues his work at LG Chem, Ltd., the impact of his innovations will undoubtedly resonate throughout the industry for years to come.