Company Filing History:
Years Active: 2014-2019
Title: The Innovations of Kurt W. Larson
Introduction
Kurt W. Larson is a notable inventor based in Cedar Crest, NM (US). He has made significant contributions to the field of semiconductor technology and microscopy, holding a total of 3 patents. His work has advanced the methods used in modifying semiconductor devices and imaging techniques.
Latest Patents
One of Larson's latest patents is titled "Method for simultaneous modification of multiple semiconductor device features." This invention describes various technologies for making multiple modifications to previously manufactured semiconductors. The process involves applying a mask layer to the semiconductor's surface, forming a pattern aligned with the features to be modified, and etching layers to create vias. Conducting material is then deposited into these vias to form new connections between the semiconductor's features.
Another significant patent is "Sparse sampling and reconstruction for electron and scanning probe microscope imaging." This patent outlines systems and methods for conducting electron or scanning probe microscopy using an undersampled data set. The process includes scanning a sample with an electron beam or probe, determining actual pixel locations visited, and processing the collected data to reconstruct an image of the sample.
Career Highlights
Kurt W. Larson has worked with prominent organizations such as Sandia Corporation and National Technology & Engineering Solutions of Sandia, LLC. His experience in these companies has allowed him to develop and refine his innovative techniques in semiconductor technology and microscopy.
Collaborations
Throughout his career, Larson has collaborated with talented individuals, including Hyrum Anderson and Jason W. Wheeler. These collaborations have contributed to the advancement of his research and inventions.
Conclusion
Kurt W. Larson's contributions to semiconductor technology and microscopy demonstrate his innovative spirit and dedication to advancing these fields. His patents reflect a commitment to improving the methods used in technology today.