Kuo-Jung Huang

Title: Kuo-Jung Huang: Innovator in Integrated Circuit Technology

Introduction

Kuo-Jung Huang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of integrated circuit technology, holding two patents that showcase his innovative approach to semiconductor design.

Latest Patents

Huang's latest patents include a method for forming an integrated circuit structure that features a silicon intermixing layer for blocking diffusion. This method involves several steps, including the formation of a gate dielectric on a wafer, the creation of a work function layer over the gate dielectric, and the deposition of a capping layer. The capping layer is soaked in a silicon-containing gas to form a silicon-containing layer, followed by the formation of a blocking layer and a metal-filling region over the blocking layer. This innovative approach enhances the performance and reliability of integrated circuits.

Career Highlights

Kuo-Jung Huang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to develop cutting-edge technologies that are essential for modern electronic devices.

Collaborations

Huang has collaborated with talented coworkers, including Chun-Chieh Wang and Yueh-Ching Pai. These collaborations have fostered a creative environment that encourages innovation and the development of advanced semiconductor technologies.

Conclusion

Kuo-Jung Huang's contributions to integrated circuit technology through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key innovator in the field. His advancements continue to influence the semiconductor industry and pave the way for future innovations.