Kuo-En Yen

Title: Innovations by Kuo-En Yen in Plasma Technology

Introduction

Kuo-En Yen is a notable inventor hailing from Tainan, Taiwan. With a focus on advancements in plasma technology, he has made significant contributions through his innovative designs and methods.

Latest Patents

Kuo-En Yen holds a patent for a “Plasma apparatus and method capable of adaptive impedance matching.” This invention encompasses a plasma reactor responsible for producing plasma for the chemical vapor deposition (CVD) process. The apparatus features a bi-polar electrostatic chuck situated within the reactor, which securely supports a wafer. An alternating current bias power supply connects to the electrostatic chuck, delivering the necessary voltage potential for ion-bombardment from the plasma. Additionally, it includes an impedance-matching circuit that balances the power output from the inner and outer electrodes of the electrostatic chuck.

Career Highlights

Kuo-En Yen is associated with United Microelectronics Corporation, a leading company in semiconductor manufacturing and technology. His role at the organization has allowed him to leverage his expertise in plasma technology, contributing to critical advancements in the field.

Collaborations

Working alongside prominent colleagues such as Chien-Hsin Lai and San-An Lin, Kuo-En Yen has fostered a collaborative environment that promotes innovation. Together, they enhance the technological capabilities and research initiatives at United Microelectronics Corporation.

Conclusion

Kuo-En Yen’s contributions in the field of plasma technology demonstrate the impact of innovative thinking on advancing semiconductor processes. His patent serves as a testament to his commitment to enhancing the efficiency and effectiveness of plasma apparatuses. As he continues his work at United Microelectronics Corporation, he remains a key contributor to technological advancements in the industry.