Tainan, Taiwan

Kuo-Ching Lee

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kuo-Ching Lee. Retrieved from https://idiyas.com/inventor/kuo-ching-lee-ondae2ta

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Kuo-Ching Lee: Innovator in Semiconductor Technology

Introduction

Kuo-Ching Lee is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to laminating and film removal systems.

Latest Patents

Kuo-Ching Lee holds a patent for a DFR laminating and film removing system. This invention is designed to laminate a dry film resist (DFR) layer on a semiconductor wafer while simultaneously removing a DFR support film, such as polyethylene terephthalate (PET), from the DFR layer at a single location. The system includes a PET support film removing head that efficiently removes a portion of the PET film from the semiconductor wafer substrate after the two layers are laminated.

Career Highlights

Kuo-Ching Lee is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing the processes involved in semiconductor manufacturing.

Collaborations

He has collaborated with notable colleagues, including Li-Chen Chen and Chia-Tsun Hsu, contributing to various projects within the semiconductor field.

Conclusion

Kuo-Ching Lee's innovative work in semiconductor technology, particularly his patent for the DFR laminating and film removing system, showcases his expertise and commitment to advancing the industry. His contributions continue to influence the field significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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