Company Filing History:
3 out of 3,781 
2 out of 26 
Years Active: 2006-2009
Title: **Inventor Kunio Ogasawara: A Pioneer in Semiconductor Technology**
Introduction
Kunio Ogasawara is a notable inventor based in Chitose, Japan, recognized for his contributions to semiconductor technology. With a total of three patents, he is committed to advancing the fabrication methods of semiconductor integrated circuit devices, demonstrating significant innovation in the field.
Latest Patents
Kunio Ogasawara's latest patent involves a fabrication method of a semiconductor integrated circuit device. This method includes the use of a ultrapure water preparing system, which incorporates ultrafiltration (UF) equipment containing a UF module made from capillary hollow fiber membranes. These membranes, composed of polysulfone or polyimide, are bonded at their ends through hot welding, which concurrently adheres them to the system's body. This innovative approach effectively prevents the run-off of ionized amine into ultrapure water, which is crucial for the fabrication of high-quality semiconductor devices.
Career Highlights
Throughout his career, Kunio Ogasawara has worked with prominent companies in the semiconductor industry, notably Renesas Technology Corporation and Hitachi Hokkai Semiconductor Ltd. His experience in these organizations has contributed to his deep understanding and expertise in semiconductor technologies and fabrication processes.
Collaborations
Kunio Ogasawara has collaborated with esteemed professionals in the field, including his coworker Osamu Takahashi. This collaborative effort has likely enhanced his research and innovative approaches, culminating in the successful development of his patents.
Conclusion
Kunio Ogasawara exemplifies the spirit of innovation in semiconductor technology. His patents underscore his dedication to improving fabrication methods that address critical challenges in the industry. As he continues to develop his work, the impact of his inventions will likely resonate throughout technological advancements in semiconductor manufacturing.