Yamanashi, Japan

Kunihko Hinata

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kunihko Hinata. Retrieved from https://idiyas.com/inventor/kunihko-hinata

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Kunihko Hinata: Innovator in Substrate Processing Technology

Introduction

Kunihko Hinata is a notable inventor based in Yamanashi, Japan. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique method that addresses challenges in the manufacturing process.

Latest Patents

Hinata holds a patent for a "Method and apparatus for reducing substrate backside deposition during processing." This invention features a focus ring assembly designed to be coupled to a substrate holder. The assembly includes a focus ring and a secondary focus ring, which work together to minimize the deposition of process residue on the backside surface of the substrate. This advancement is crucial for improving the quality and efficiency of substrate processing.

Career Highlights

Kunihko Hinata is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in technology.

Collaborations

Hinata collaborates with Yasunori Hatamura, a fellow innovator in the field. Their partnership enhances the development of new technologies and solutions in substrate processing.

Conclusion

Kunihko Hinata's contributions to substrate processing technology exemplify the impact of innovation in the semiconductor industry. His patent and collaboration with other professionals highlight the importance of teamwork in advancing technological solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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