Maizuru, Japan

Kuniaki Noami

This inventor holds 1 USPTO granted patent. Top assignees: Hitachi Zosen Metal Works Co., Ltd., Mimasu Semiconductor Industry Co., Ltd., Ohtomo Chemical Ind., Corp.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kuniaki Noami. Retrieved from https://idiyas.com/inventor/kuniaki-noami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Kuniaki Noami: Innovator in Semiconductor Slicing Technology

Introduction

Kuniaki Noami is a notable inventor based in Maizuru, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of waste management and resource recovery.

Latest Patents

Kuniaki Noami holds a patent for a system designed for the recovery of coolant and abrasive grains used in slicing semiconductors. This innovative system focuses on reusing water-soluble slurry waste fluid, allowing for the effective separation and reuse of abrasive grains and extracted coolant. By implementing this system, companies can significantly reduce disposal costs and contribute to a decrease in overall slicing costs.

Career Highlights

Throughout his career, Kuniaki Noami has worked with prominent companies in the semiconductor industry, including Mimasu Semiconductor Industry Co., Ltd. and Shin-Etsu Handotai Co., Ltd. His work has been instrumental in advancing technologies that promote sustainability and efficiency in semiconductor manufacturing.

Collaborations

Kuniaki Noami has collaborated with several professionals in his field, including Shingo Kaburagi and Takara Ito. These collaborations have further enhanced his contributions to semiconductor technology.

Conclusion

Kuniaki Noami's innovative approach to resource recovery in semiconductor slicing demonstrates his commitment to sustainability and efficiency. His patent and career achievements reflect his significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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