Kung Shu Hsu

Title: Innovations by Kung Shu Hsu in Semiconductor Manufacturing

Introduction

Kung Shu Hsu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 3 patents. His work focuses on methods that enhance the efficiency and uniformity of semiconductor devices.

Latest Patents

Hsu's latest patents include a method of manufacturing a semiconductor device and a semiconductor device itself. In his method, a sacrificial gate structure is formed over a substrate, followed by the creation of multiple dielectric layers. The process involves planarizing and recessing these layers to expose the sacrificial gate structure. This innovative approach allows for improved manufacturing techniques in semiconductor devices. Additionally, his patent on semiconductor devices and methods of formation emphasizes the importance of uniformity in etching processes. By optimizing gas flows in etch tools, Hsu's methods promote consistent etch rates across devices, enhancing the overall quality of semiconductor manufacturing.

Career Highlights

Kung Shu Hsu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have positioned him as a valuable asset in the field.

Collaborations

Hsu has collaborated with notable coworkers, including Hsu Ming Hsiao and Shen H Wang, contributing to advancements in semiconductor technology.

Conclusion

Kung Shu Hsu's contributions to semiconductor manufacturing through his innovative patents and collaborative efforts highlight his importance in the industry. His work continues to influence the development of more efficient semiconductor devices.