Wuhan, China

Kun Wan


 

Average Co-Inventor Count = 9.1

ph-index = 1


Company Filing History:


Years Active: 2022-2025

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4 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Kun Wan from Wuhan, CN

Introduction

Kun Wan is a distinguished inventor based in Wuhan, China, known for his significant contributions to the field of material science. With a portfolio that boasts three patents, Kun has made headway in developing innovative methods that harness the power of plasma technology.

Latest Patents

Two of Kun Wan's latest patents focus on the preparation of Metal-Organic Frameworks (MoFs) utilizing plasma activation of sulfur fluoride (SF). The first patent, titled "Method for preparing MoF based on plasma activation of SF," describes a detailed process consisting of three main steps. The method includes filling a discharge area of a plasma reactor with molybdenum powder, introducing an inert gas along with SF gas into the reactor, and generating MoF gas and sulfur elements through a reaction of ionized fluorine atoms with molybdenum powder.

The second patent complements the first with a focus on a screening method for constitutive expression vector promoters based on transcriptome sequencing. This innovative method allows for the identification of effective promoters for expression vectors, beneficial in various biotechnological applications.

Career Highlights

Throughout his career, Kun Wan has shown a commitment to advancing technology and has worked for Wuhan Grand Hoyo Co., Ltd. His role in this company allowed him to apply his inventiveness and expertise in practical applications, further establishing his reputation in the industry.

Collaborations

Kun has collaborated with esteemed colleagues, including Xuechen Mei and Jiong Wang, which underscores the importance of teamwork in fostering innovative solutions. These collaborations have likely contributed to the development of his patents and the advancement of his research.

Conclusion

In conclusion, Kun Wan is an exemplary figure in the world of innovation and invention. His work not only highlights the potential of plasma technology in materials science but also reflects his dedication to pushing the boundaries of research and development. As he continues to innovate, the implications of his work are sure to resonate within the academic and industrial landscapes.

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