The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2025

Filed:

Oct. 29, 2024
Applicants:

Hubei University of Technology, Wuhan, CN;

Electric Power Research Institute China Southern Power Grid, Guangzhou, CN;

Handan Puxin Electric Power Technology Co., Ltd., Handan, CN;

Inventors:

Yalong Li, Wuhan, CN;

Xiaoxing Zhang, Wuhan, CN;

Mingli Fu, Guangzhou, CN;

Zhaodi Yang, Wuhan, CN;

Lei Jia, Guangzhou, CN;

Kun Wan, Wuhan, CN;

Dibo Wang, Guangzhou, CN;

Guozhi Zhang, Wuhan, CN;

Shuangshuang Tian, Wuhan, CN;

Guoguang Zhang, Wuhan, CN;

Guangke Li, Handan, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01G 41/04 (2005.12); B01J 19/00 (2005.12);
U.S. Cl.
CPC ...
C01G 41/04 (2012.12); B01J 19/0053 (2012.12);
Abstract

Disclosed are a tungsten hexafluoride preparation method and apparatus based on photoelectric synergy. A photocatalyst and metal tungsten are sequentially filled in a discharge area of a plasma reactor in a direction of gas entry, and the discharge area of the plasma reactor is irradiated with light at the same time; the background gas generates a large amount of plasma in the discharge area, SFundergoes decomposition under the synergistic effect of photocatalysis and plasma, SFis decomposed to generate fluorine atoms and low-fluorine sulfides such as SFand SF. The generated fluorine ions, SF, SFand low-fluorine sulfides further react with metal tungsten to generate WFspecialty gas, which not only realizes the utilization of fluorine resources of SF, but also replaces highly toxic fluorine gas with non-toxic SFexhaust gas in the plasma reactor for reaction, thereby ensuring safe operation and low energy consumption.


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