Nanjing, China

Kun Tang

This inventor holds 1 USPTO granted patent. Top assignee: Nanjing University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kun Tang. Retrieved from https://idiyas.com/inventor/kun-tang-aaecumnm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Kun Tang - Innovator in MPCVD Technology

Introduction

Kun Tang is a prominent inventor based in Nanjing, China. He has made significant contributions to the field of chemical vapor deposition technology. His innovative work focuses on enhancing the efficiency of doping processes in semiconductor manufacturing.

Latest Patents

Kun Tang holds a patent for an MPCVD device capable of realizing effective doping. This device comprises a reaction chamber and a gas input structure. The gas input structure includes a first pipeline and a second pipeline for reaction gas. A first gas distributor is connected with the first pipeline, which uniformly transports gas as a first reactant into the reaction chamber. The gas outlet of the first pipeline is located near the top of the reaction chamber. The second pipeline uniformly inputs a doped reaction gas to a surface of a substrate through a second gas distributor. This second distributor is in the form of a gas transport ring with a circular shape. The height in the vertical direction of the gas transport ring connected with the second pipeline is substantially the same as that of a support for the substrate. The gas transport ring can be concentrically placed at a center position inside the support or concentrically placed outside the support.

Career Highlights

Kun Tang is affiliated with Nanjing University, where he continues to advance research in his field. His work has garnered attention for its potential applications in semiconductor technology. He has demonstrated a commitment to innovation and excellence in his research endeavors.

Collaborations

Kun Tang has collaborated with notable colleagues, including Shulin Gu and Shunming Zhu. These collaborations have further enriched his research and contributed to advancements in the field.

Conclusion

Kun Tang is a distinguished inventor whose work in MPCVD technology is paving the way for advancements in semiconductor manufacturing. His innovative patent reflects his dedication to improving doping processes, showcasing his impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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