The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2026
Filed:
Mar. 01, 2023
Nanjing University, Nanjing, CN;
Shulin Gu, Nanjing, CN;
Songmin Liu, Nanjing, CN;
Shunming Zhu, Nanjing, CN;
Jiandong Ye, Nanjing, CN;
Kun Tang, Nanjing, CN;
Zili Xie, Nanjing, CN;
Rong Zhang, Nanjing, CN;
Youdou Zheng, Nanjing, CN;
Nanjing University, Nanjing, CN;
Abstract
An MPCVD device capable of realizing effective doping comprises a reaction chamber and a gas input structure, wherein the gas input structure includes a first pipeline and a second pipeline for reaction gas, a first gas distributor connected with the first pipeline that uniformly transports gas as a first reactant into the reaction chamber through a gas outlet of the first pipeline located near the top of the reaction chamber, wherein the second pipeline uniformly inputs a doped reaction gas to a surface of a substrate through a second gas distributor in the form of a gas transport ring having a circular shape, wherein a height in the vertical direction of the gas transport ring connected with the second pipeline is substantially the same as that of a support for the substrate. The gas transport ring can be concentrically placed at a center position inside the support, or concentrically placed outside the support.