Taejon, South Korea

Kun Sik Park

This inventor holds 4 USPTO granted patents. Top assignees: Hyundai Electronics Industries Co. Ltd., Lg Semicon Co., Ltd.. Active years: 2001-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kun Sik Park. Retrieved from https://idiyas.com/inventor/kun-sik-park-orm8xpxo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.2

ph-index = 3

Forward Citations = 25(Granted Patents)


Location History:

  • Taejon-si, KR (2001)
  • Taejon-kwangyoksi, KR (2001)
  • Chungcheongbuk-do, KR (2001 - 2002)

Company Filing History:


Years Active: 2001-2002

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4 patents (USPTO):Explore Patents

Title: Innovations of Kun Sik Park

Introduction

Kun Sik Park is a notable inventor based in Taejon-si, South Korea. He has made significant contributions to the field of electronics, particularly in capacitor technology. With a total of 4 patents to his name, Park has demonstrated a commitment to advancing the capabilities of electronic components.

Latest Patents

One of his latest patents is titled "Capacitor and method for fabricating the same." This invention simplifies the fabrication process and reduces parasitic capacitances between signal lines. The capacitor includes a first insulating layer formed on a substrate, a bitline patterned on the first insulating layer, a second insulating layer formed on the bitline, a first electrode with slopes at both sides, a dielectric film on the first electrode, a node contact in contact with the substrate, and a second electrode connected with the node contact electrically. The method for fabricating this capacitor involves several steps, including forming insulating layers, depositing conductive materials, and etching to create the necessary structures.

Another significant patent is the "Method for fabricating capacitor in DRAM cell." This method outlines the steps for creating a capacitor in a DRAM cell, including forming wordlines, source/drain impurity regions, and capacitor storage electrodes. The process emphasizes the importance of precise layering and etching to achieve optimal performance in semiconductor devices.

Career Highlights

Throughout his career, Kun Sik Park has worked with prominent companies in the electronics industry, including Hyundai Electronics Industries Co., Ltd. and LG Semicon Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects that push the boundaries of technology.

Collaborations

Park has collaborated with notable colleagues such as Wouns Yang and Won Cheol Cho. These partnerships have fostered an environment of creativity and innovation, leading to advancements in their respective fields.

Conclusion

Kun Sik Park's contributions to capacitor technology and his innovative methods for fabrication have made a lasting impact on the electronics industry. His work continues to inspire future advancements in semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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