Taipei, Taiwan

Kun-Lung Lee

This inventor holds 1 USPTO granted patent. Top assignee: Lite-On Singapore Pte. Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kun-Lung Lee. Retrieved from https://idiyas.com/inventor/kun-lung-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Kun-Lung Lee: Innovator in Optical Module Manufacturing

Introduction

Kun-Lung Lee is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of optical module manufacturing. His innovative approach has led to the development of a unique manufacturing method that enhances the efficiency and effectiveness of optical modules.

Latest Patents

Kun-Lung Lee holds a patent for a manufacturing method of an optical module. This method involves several key steps, including attaching a light-emitting diode light-emitting device and a sensor on a substrate. The process also includes disposing of encapsulation portions and a shielding layer, followed by the removal of specific portions to create openings for the light-emitting device and sensor. Finally, a third encapsulation layer is formed to complete the module.

Career Highlights

Kun-Lung Lee is currently employed at Lite-On Singapore Pte. Ltd. His work at this company has allowed him to focus on advancing optical technologies. His dedication to innovation is evident in his patent and the impact it has on the industry.

Collaborations

Some of his coworkers include Suresh Basoor Nijaguna and Guo-Jun Xu. Their collaboration has likely contributed to the success of the projects they have worked on together.

Conclusion

Kun-Lung Lee is a prominent figure in the field of optical module manufacturing, with a patent that showcases his innovative spirit. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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