This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2011-2014.
Company Filing History:
Years Active: 2011-2014
Title: Innovations of Kun-Long Hsieh in Semiconductor Cleaning Technologies
Introduction
Kun-Long Hsieh is a notable inventor based in Luchu, Taiwan. He has made significant contributions to the field of semiconductor cleaning technologies, holding 2 patents that focus on innovative methods for cleaning photolithographic masks and semiconductor wafers. His work is essential in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Hsieh's latest patents include a method for cleaning photo masks and semiconductor wafers using a jetspray nozzle. This method involves mixing a gas and water in a jetspray nozzle, which discharges a jetspray stream onto the photolithographic mask or wafer. The water jetspray stream consists of micro water droplets that effectively dislodge contaminant particles from the surface. The process includes radially injecting gas from multiple nozzles into the water stream, ensuring thorough cleaning.
Another significant patent is the jetspray nozzle designed for cleaning photolithographic masks or semiconductor wafers. This nozzle features a water supply inlet, a gas supply inlet, and a mixing cavity that combines gas and water to deliver a concentrated cleaning stream. The nozzle is capable of cleaning without the use of chemicals, utilizing deionized water and nitrogen gas in its operation.
Career Highlights
Kun-Long Hsieh is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this company has allowed him to develop and refine his innovative cleaning technologies, contributing to the advancement of semiconductor manufacturing.
Collaborations
Hsieh collaborates with Chien-Hsing Lu, who is also involved in the semiconductor field. Their partnership enhances the development of effective cleaning solutions for semiconductor manufacturing.
Conclusion
Kun-Long Hsieh's contributions to semiconductor cleaning technologies through his innovative patents demonstrate his expertise and commitment to improving manufacturing processes. His work continues to influence the industry positively.