Kun Ku Hung

Title: Kun Ku Hung: Innovator in Semiconductor Technology

Introduction

Kun Ku Hung is a notable inventor based in Changhua, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in methods that enhance the performance and reliability of semiconductor devices. His innovative approach has led to the development of a patented method that addresses critical challenges in the manufacturing process.

Latest Patents

Kun Ku Hung holds a patent for a "Method for preventing or reducing anodic Cu corrosion during CMP." This invention provides a method and apparatus designed to prevent or reduce corrosion of copper-containing features in semiconductor wafers during the chemical mechanical polishing (CMP) process. The method involves polishing semiconductor wafer surfaces that include copper-filled anisotropically etched features, ensuring that the polishing pad surface is in electrically conductive communication with a conductive polishing platen. This innovative approach enhances the durability and performance of semiconductor devices.

Career Highlights

Kun Ku Hung is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this prestigious company has allowed him to contribute to advancements in semiconductor manufacturing processes. His expertise in chemical mechanical polishing has positioned him as a valuable asset in the field.

Collaborations

Throughout his career, Kun Ku Hung has collaborated with esteemed colleagues, including Tsu Shih and Wen-Hun Tung. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Kun Ku Hung's contributions to semiconductor technology, particularly through his patented methods, highlight his role as an influential inventor in the industry. His work continues to impact the efficiency and reliability of semiconductor devices, showcasing the importance of innovation in this rapidly evolving field.