This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2018.
Company Filing History:
Years Active: 2018
Title: Kun-Jin Wu: Innovator in Extreme Ultraviolet Lithography
Introduction
Kun-Jin Wu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of lithography, particularly in the development of extreme ultraviolet (EUV) lithography systems. His innovative work has implications for the semiconductor manufacturing industry.
Latest Patents
Kun-Jin Wu holds a patent for an "Extreme Ultraviolet Lithography System with Debris Trapper on Exhaust Line." This advanced EUV lithography system features a collector designed to collect and reflect EUV radiation. It includes a cover integrated with the collector, a first exhaust line connected to the cover to receive debris vapor from the collector, and a debris trapper connected to the first exhaust line to trap the debris vapor. Additionally, a second exhaust line is connected to the debris trapper, enhancing the system's efficiency.
Career Highlights
Kun-Jin Wu is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work at this leading semiconductor manufacturer has positioned him at the forefront of technological advancements in lithography. His expertise and innovative mindset have contributed to the company's success in producing cutting-edge semiconductor devices.
Collaborations
Kun-Jin Wu has collaborated with notable colleagues, including Shang-Chieh Chien and Jye-Fu Jeng. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies in the semiconductor field.
Conclusion
Kun-Jin Wu's contributions to extreme ultraviolet lithography exemplify the importance of innovation in the semiconductor industry. His patent and collaborative efforts highlight his role as a key player in advancing lithography technology.