Taipei, Taiwan

Kuei-Yu Cian

This inventor holds 1 USPTO granted patent. Top assignee: National Taiwan University. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kuei-Yu Cian. Retrieved from https://idiyas.com/inventor/kuei-yu-cian

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Kuei-Yu Cian: Innovator in Interlayer Fabrication

Introduction

Kuei-Yu Cian is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of material science, particularly in the fabrication of interlayers for photoelectric devices. His innovative approach has the potential to enhance the efficiency and yield of these devices.

Latest Patents

Kuei-Yu Cian holds a patent titled "Method for Fabricating an Interlayer." This invention focuses on a method for creating an interlayer PCBM that is resistant to dissolution in organic solvents. By decreasing the solubility of the interlayer through polymerization, he has developed a technique that allows for better control over the thickness of the interlayer. This advancement can lead to improved performance in photoelectric devices.

Career Highlights

Cian is affiliated with National Taiwan University, where he conducts research and development in material science. His work has garnered attention for its practical applications in enhancing the functionality of electronic devices.

Collaborations

Kuei-Yu Cian has collaborated with several colleagues, including Ching-Fuh Lin and Shao-Hsuan Kao. These partnerships have contributed to the advancement of research in the field of interlayer fabrication.

Conclusion

Kuei-Yu Cian's innovative methods in interlayer fabrication represent a significant step forward in the development of efficient photoelectric devices. His contributions to material science continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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