Kuei-Hsu Chou

Title: Kuei-Hsu Chou: Innovator in Layout Pattern Correction

Introduction

Kuei-Hsu Chou is a notable inventor based in Pingtung, Taiwan. He has made significant contributions to the field of layout pattern correction, particularly through his innovative methods that enhance the precision of optical proximity correction.

Latest Patents

Kuei-Hsu Chou holds a patent for a "Method for correcting bevel corners of a layout pattern." This invention provides a systematic approach to correcting layout patterns that include at least two adjacent rectangular sub-patterns. The method involves inputting the layout pattern into a computer system, performing optical proximity correction, and specifically addressing bevel corrections at the corners of the sub-patterns. The process ensures that the bevel is formed by chopping the corner and adjusting its position based on the proximity to neighboring segments, thereby improving the overall layout accuracy.

Career Highlights

Kuei-Hsu Chou is associated with United Microelectronics Corporation, a leading semiconductor company. His work at this organization has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor manufacturing processes.

Collaborations

Kuei-Hsu Chou has collaborated with several talented individuals in his field, including Yung-Feng Cheng and Cheng-Te Wang. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Kuei-Hsu Chou's contributions to the field of layout pattern correction exemplify the importance of innovation in technology. His patent and work at United Microelectronics Corporation highlight his role as a key figure in advancing semiconductor manufacturing techniques.