Hsinchu, Taiwan

Kuang-Hung Lin


Average Co-Inventor Count = 2.4

ph-index = 3

Forward Citations = 35(Granted Patents)


Location History:

  • Taipei, TW (1998)
  • Hsin Chu, TW (1999 - 2003)

Company Filing History:


Years Active: 1998-2003

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3 patents (USPTO):Explore Patents

Title: Innovations by Kuang-Hung Lin

Introduction

Kuang-Hung Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patents. With a total of 3 patents, Lin has demonstrated his expertise and commitment to advancing technology.

Latest Patents

One of Lin's latest patents is focused on the removal of wafer edge defocus due to chemical mechanical polishing (CMP). This invention addresses the topography differences that can occur at the periphery of a wafer after CMP. By varying the type of polishing pad and retainer ring used in successive CMP operations, Lin's method ensures a uniformly flat final surface. The conditions required to achieve the desired surface topography are thoroughly described and discussed in his patent.

Another significant patent by Lin is a method and apparatus for controlling air flow in a liquid coater. This invention features an adjustable housing that allows for the modification of the cavity height, which in turn adjusts the spacing between the substrate and the upper compartment's interior wall. This innovation prevents the redeposition of liquid coating particles, thereby reducing contamination on the substrate surface. The adjustable air flow rate is achieved through a removable roof member that can be adjusted as needed.

Career Highlights

Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work there has allowed him to apply his innovative ideas in a practical setting, contributing to the company's success and technological advancements.

Collaborations

Lin has collaborated with several talented individuals in his field, including Dong-Hsu Cheng and Cheng-Wei Huang. These collaborations have likely enriched his work and led to further innovations in semiconductor technology.

Conclusion

Kuang-Hung Lin's contributions to the semiconductor industry through his patents reflect his innovative spirit and dedication to improving manufacturing processes. His work continues to influence the field and showcases the importance of innovation in technology.

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