Location History:
- Hsin-Chu, TW (2019 - 2021)
- New Taipei, TW (2021)
Company Filing History:
5 out of 40,780 
5 out of 1,198 Years Active: 2019-2021
Title: Innovative Contributions of Kuan-Yu Chang
Introduction
Kuan-Yu Chang, a notable inventor based in Hsinchu, Taiwan, has made significant strides in the field of semiconductor technology. With a total of five patents to his name, he continues to push the boundaries of innovation, particularly with his work in tunneling field effect transistors.
Latest Patents
One of Chang's latest innovations is the development of a staggered-type tunneling field effect transistor. This groundbreaking design features an overlapping structure between the source and drain regions, which allows for a greater tunneling area. The source or drain region can be a doped region situated in a semi-conductive substrate, while the opposite region is created through epitaxial deposition over the doped area. The gate is strategically formed over the epitaxial region where both the doped and epitaxial regions overlap. This design may also include a fin structure for the doped region, with the gate and epitaxial region layered on the top and sides of the fin.
Career Highlights
Kuan-Yu Chang has garnered experience by working with leading institutions. Notable among these are Taiwan Semiconductor Manufacturing Company Limited and National Yang Ming Chiao Tung University. His work in these esteemed organizations has not only honed his skills but also contributed to the advancement of semiconductor technology.
Collaborations
During his career, Chang has collaborated with prominent individuals in the field, including coworkers Steve S. Chung and E. Ray Hsieh. These collaborations have facilitated a rich exchange of ideas and furthered the development of innovative solutions in semiconductor designs.
Conclusion
Kuan-Yu Chang stands out as a dedicated inventor in the realm of semiconductor technology. His contributions, particularly in developing the tunneling field effect transistor, showcase his commitment to innovation. With further advancements on the horizon, his work continues to inspire the next generation of inventors and researchers in the field.