This inventor holds 1 USPTO granted patent. Top assignee: Altera Corporation. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Kuan Yeow Leong: Innovator in EDA Applications
Introduction
Kuan Yeow Leong is a notable inventor based in Penang, Malaysia. He has made significant contributions to the field of electronic design automation (EDA). His innovative work has led to the development of a patent that enhances the verification processes in photomask representations.
Latest Patents
Kuan Yeow Leong holds a patent titled "Automated verification of transformational operations on a photomask representation." This invention involves an EDA application that creates a physical parameterized cell (PCell) from a computer-aided design (CAD) database. The application relates the physical PCell to a collection of expected mask layers. It auto-places an identifying text label with the physical PCell and converts both into a format that represents them as a sequence of drawn layers. The EDA application generates an equation to perform transformational operations on these drawn layers, creating a sequence of derived layers that define a collection of logical mask layers. The application then executes the equation and compares the derived layer to the expected mask layers, reporting any variances based on the text label.
Career Highlights
Kuan Yeow Leong is currently employed at Altera Corporation, where he continues to innovate in the field of EDA. His work has been instrumental in improving the efficiency and accuracy of design processes in semiconductor manufacturing.
Collaborations
Throughout his career, Kuan has collaborated with talented individuals such as Girish Venkitachalam and Hai Dang. These collaborations have further enriched his work and contributed to advancements in EDA applications.
Conclusion
Kuan Yeow Leong is a distinguished inventor whose contributions to electronic design automation have made a significant impact in the industry. His innovative patent demonstrates his commitment to enhancing verification processes in photomask representations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
