The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2014
Filed:
May. 29, 2009
Girish Venkitachalam, San Jose, CA (US);
Hai Thai Dang, San Jose, CA (US);
Peter J. Mcelheny, Morgan Hill, CA (US);
Kuan Yeow Leong, Penang, MY;
Girish Venkitachalam, San Jose, CA (US);
Hai Thai Dang, San Jose, CA (US);
Peter J. McElheny, Morgan Hill, CA (US);
Kuan Yeow Leong, Penang, MY;
Altera Corporation, San Jose, CA (US);
Abstract
In an example embodiment, an EDA application creates a physical PCell from a CAD database that relates the physical PCell to a collection of expected mask layers. The EDA application auto-places an identifying text label with the physical and converts the physical PCell and the text label to a format that represents the physical PCell and the text label as sequence of drawn layers. The EDA application generates an equation that performs transformational operations on the drawn layers to create a sequence of derived layers, where the sequence of derived layers defines a collection of logical mask layers. The EDA application executes the equation and compares a derived layer to the expected mask layers, if the derived layer interacts with the derived layer for the text label. If the compared derived layer varies from the expected mask layers, the EDA application reports a variance based on the text label.