Kuan-Liang Wu

Title: Kuan-Liang Wu: Innovator in Semiconductor Technology

Introduction

Kuan-Liang Wu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative approach to integrated circuit devices.

Latest Patents

One of Kuan-Liang Wu's latest patents is the Hybrid Multi-Layer Mask. This invention involves a hybrid mask set designed for exposing multiple layers on a semiconductor substrate to create integrated circuit devices. The hybrid mask set includes a first group of one or more multi-layer masks (MLMs) for a first subset of the layers. Each MLM features a variety of different images for different layers, with the images separated by a relatively wide image spacer. Additionally, the hybrid mask set comprises a first group of one or more production-ready masks for a second subset of the layers. Each production-ready mask contains a plurality of similar images for a common layer, with each image separated by a relatively narrow scribe street.

Career Highlights

Kuan-Liang Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on advancing technologies that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Kuan-Liang Wu has collaborated with notable colleagues, including Feng-Lung Lin and Che-Rong Liang. These partnerships have contributed to the development of innovative solutions in the semiconductor field.

Conclusion

Kuan-Liang Wu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of integrated circuit devices, showcasing the importance of innovation in technology.