Krupakar M Subramanian

Title: Innovations by Krupakar M Subramanian

Introduction

Krupakar M Subramanian is a notable inventor based in Coimbatore, India. He has made significant contributions to the field of technology, particularly in the area of nanoparticle positioning and semiconductor etching. With a total of 4 patents to his name, his work continues to influence advancements in these domains.

Latest Patents

One of his latest patents is a device for positioning nanoparticles. This invention is directed towards a system for controlling the placement of nanoparticles, utilizing a substrate with multiple funnels. Each funnel features an inlet opening and an elongated, rectangular outlet opening. The method involves creating a dusty plasma with carbon nanotubes and positioning a mask to control the placement of these nanotubes on a target.

Another significant patent involves methods of etching trenches into silicon of a semiconductor substrate. This method includes forming a mask over the silicon, which has trenches formed through it. Plasma etching is then conducted to create trenches in the silicon using the mask. The etching plasma comprises various precursor gases, including sulfur and oxygen-containing compounds.

Career Highlights

Krupakar M Subramanian is currently associated with Micron Technology Incorporated, where he applies his expertise in semiconductor technology and nanoparticle applications. His innovative approaches have contributed to the company's advancements in these fields.

Collaborations

He has collaborated with notable coworkers such as Neal R Rueger and Gurtej S Sandhu, further enhancing the impact of his inventions through teamwork and shared expertise.

Conclusion

Krupakar M Subramanian's contributions to technology through his patents reflect his innovative spirit and dedication to advancing the field. His work continues to pave the way for future developments in nanoparticle positioning and semiconductor technology.