Phoenix, AZ, United States of America

Krishnaswamy Mahadevan

This inventor holds 1 USPTO granted patent and 8 published patent applications. Top assignee: Asm IP Holding B.v.. Active years: 2026.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Krishnaswamy Mahadevan: Innovator in Semiconductor Processing Systems

Introduction

Krishnaswamy Mahadevan is an inventor based in Tempe, AZ (US). He has made significant contributions to the field of semiconductor processing systems. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

1. **GAS INJECTION SYSTEMS FOR SUPPLYING GAS INTO A REACTION CHAMBER AND SEMICONDUCTOR PROCESSING SYSTEM INCLUDING GAS INJECTION SYSTEMS** - This application discloses gas injection systems and semiconductor processing systems that include such gas injection systems. The systems feature an injector housing with a first series of injection ports and a separate second series of injection ports designed to minimize parasitic deposition on the inner surfaces of a reaction chamber. Additionally, methods for forming silicon-containing layers within a reaction chamber while reducing parasitic deposition are also described.

2. **LIQUID PRECURSOR CONTAINERS, LIQUID PRECURSOR SYSTEMS AND SEMICONDUCTOR PROCESSING SYSTEMS HAVING LIQUID PRECURSOR CONTAINERS, AND METHODS OF DEPOSITING MATERIAL LAYERS USING LIQUID PRECURSORS** - This application presents a liquid precursor container that consists of an inner container, an outer container, and a baffle member. The inner container features an inner base portion, an inner intermediate portion extending upwards, and an inner lid portion. The outer container is designed with an outer base portion spaced apart from the inner base portion and an outer intermediate portion that extends upwards around the inner intermediate portion. The baffle member is strategically placed between the inner and outer containers to enhance functionality.

Conclusion

Krishnaswamy Mahadevan is an innovative inventor whose work in semiconductor processing systems showcases his commitment to advancing technology. His latest patent applications reflect his dedication to improving gas injection and liquid precursor systems.

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