Krishnasamy Rajendran

Title: Innovations in Semiconductor Technology by Inventor Krishnasamy Rajendran

Introduction

Krishnasamy Rajendran, an innovative inventor based in Heverlee, Belgium, has made significant contributions to the field of semiconductor technology. With a focus on precision in manufacturing processes, his work has paved the way for advancements in MOSFET device fabrication.

Latest Patents

Rajendran holds a patent for a remarkable process aimed at achieving uniform groove depth in a silicon substrate. This process is crucial for forming grooves in semiconductor substrates, which are essential for the fabrication of grooved gate MOSFET devices. The innovative technique utilizes an insulator mask as an etch mask, allowing for precise groove definition in the semiconductor substrate. A selective, anisotropic RIE (Reactive Ion Etching) procedure ensures that the etching process maintains the specific groove depth throughout the fabrication stages. Ultimately, when the insulator shape is removed from the top surface, the established groove depth remains unchanged, ensuring uniformity and accuracy.

Career Highlights

Krishnasamy Rajendran is associated with Chartered Semiconductor Manufacturing Ltd, a corporation known for its cutting-edge semiconductor solutions. His dedication to advancing semiconductor manufacturing processes has garnered him recognition in the industry. This patent highlights his commitment to enhancing efficiency and precision in the production of semiconductor devices.

Collaborations

Throughout his career, Rajendran has collaborated with talented professionals such as Ganesh S Samudra and Chi Kwan Lau. Their teamwork has contributed to innovations that push the boundaries of semiconductor technology, ultimately benefiting various applications in electronics.

Conclusion

In summary, Krishnasamy Rajendran’s innovative approach to semiconductor manufacturing, particularly in the creation of uniform grooves in silicon substrates, showcases his valuable contribution to the field. His patent not only exemplifies a significant technological advancement but also highlights the importance of collaboration in achieving excellence in research and development.