Krishna K Nair

Title: Innovations of Krishna K Nair in Integrated Circuit Substrates

Introduction

Krishna K Nair is a notable inventor based in Binghamton, NY (US). He has made significant contributions to the field of integrated circuit technology. His innovative work has led to the development of a patented process that enhances the performance of multilayer integrated circuit substrates.

Latest Patents

Krishna K Nair holds a patent for a "Process for making multilayer integrated circuit substrate." This process provides improved via connections by applying a first layer of chrome-copper-chrome to a ceramic substrate. The circuits are then etched, followed by the application of a polyimide layer that is cured and developed to create via holes down to the M1 circuitry. The top chrome is etched to expose the M1 copper in the via holes. A second layer of copper-chrome is evaporated onto the polyimide at a high substrate temperature, ensuring a copper interface at the base of the vias with no visible grain boundaries and low resistance. This innovative approach allows for efficient M2 circuitization.

Career Highlights

Krishna K Nair is associated with International Business Machines Corporation (IBM), where he has contributed to various projects in integrated circuit technology. His expertise in the field has been instrumental in advancing the company's technological capabilities.

Collaborations

One of his notable collaborators is Keith A Snyder. Together, they have worked on projects that leverage their combined expertise in integrated circuit design and manufacturing.

Conclusion

Krishna K Nair's contributions to the field of integrated circuits through his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the development of efficient and high-performance electronic components.