Kozo Kato

Title: Kozo Kato: Innovator in Semiconductor Manufacturing

Introduction

Kozo Kato is a notable inventor based in Nisshin, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative approach has led to the development of a unique method that enhances the efficiency of semiconductor devices.

Latest Patents

Kozo Kato holds 1 patent for his invention titled "Manufacturing method of semiconductor device." This patent describes a method that includes a trench forming step, a laser irradiation step, and a peeling step. In the trench forming step, a trench is formed on a first main surface of a semiconductor substrate that has a device structure. The laser irradiation step involves irradiating a laser from the second main surface of the substrate to a plane surface at a predetermined depth. Finally, the peeling step allows for the device layer to be peeled off from the substrate along the plane surface where the laser was applied. This method can be performed with the trenches either unfilled or filled with a material that has a lower coefficient of thermal expansion than the semiconductor substrate.

Career Highlights

Throughout his career, Kozo Kato has worked with prominent companies such as Denso Corporation and Toyota Jidosha Kabushiki Kaisha. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Kozo Kato has collaborated with notable colleagues, including Takashi Ushijima and Yoshitaka Nagasato. These partnerships have further enriched his work and advancements in the semiconductor field.

Conclusion

Kozo Kato's contributions to semiconductor manufacturing through his innovative patent demonstrate his significant role in advancing technology. His work continues to influence the industry and inspire future innovations.