This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Materials Corporation. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: Koutaro Masuyama: Innovator in Silica Porous Film Technology
Introduction
Koutaro Masuyama is a notable inventor based in Ushiku, Japan. He has made significant contributions to the field of materials science, particularly in the development of silica porous films. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this specialized area.
Latest Patents
Koutaro Masuyama holds a patent for a "Liquid composition for forming silica porous film and silica porous film formed from such liquid composition." This invention involves a unique liquid composition prepared by mixing a hydrolyzate of tetramethoxysilane or tetraethoxysilane with a silica sol. The silica sol contains fumed silica particles with specific particle size distributions, which are crucial for the formation of the silica porous film. The mass ratio of the SiO content in the silica sol to that in the hydrolyzate is carefully controlled, ranging from 1/99 to 60/40, to achieve optimal results. Koutaro Masuyama has 1 patent to his name.
Career Highlights
Koutaro Masuyama is associated with Mitsubishi Materials Corporation, where he has been able to apply his innovative ideas in a practical setting. His work at the company has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to materials science.
Collaborations
Some of Koutaro Masuyama's coworkers include Satoko Higano and Kazuhiko Yamasaki. Their collaborative efforts have likely played a role in advancing the research and development of silica porous films and related technologies.
Conclusion
Koutaro Masuyama's contributions to the field of silica porous film technology highlight his innovative spirit and dedication to advancing materials science. His patent reflects a significant achievement in this area, showcasing the potential applications of his work in various industries.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
