Koutaro Endo is a prominent inventor based in Kanagawa-ken, Japan. He has made significant contributions to the field of photolithography, particularly in the development of advanced photoresist compositions. With a total of 5 patents to his name, Endo's work has had a substantial impact on the semiconductor industry.

Latest Patents

Endo's latest patents include a novel multilayered body for photolithographic patterning. This innovation allows for the creation of a patterned resist layer with an excellent cross-sectional profile. The multilayered structure consists of an underlying water-insoluble anti-reflection film and a negative-working photoresist layer made from a specific photoresist composition. Additionally, he has developed a negative-working chemical-amplification photoresist composition that includes an alkali-soluble resin, an acid-generating agent, and a crosslinking agent. This composition is particularly effective for forming a photoresist layer on substrates with an undercoating of a water-insoluble organic anti-reflection film, ensuring excellent pattern resolution.

Career Highlights

Koutaro Endo is currently employed at Tokyo Ohka Kogyo Co., Ltd., where he continues to innovate in the field of photolithography. His work has been instrumental in advancing the technology used in semiconductor manufacturing processes.

Collaborations

Endo has collaborated with notable colleagues such as Toshikazu Tachikawa and Fumitake Kaneko. These partnerships have further enhanced the quality and impact of his inventions.

Conclusion

Koutaro Endo's contributions to photolithographic technology demonstrate his expertise and commitment to innovation. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing, making him a key figure in this field.

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