Koushi Tozuka

Title: Koushi Tozuka: Innovator in Semiconductor Technology

Introduction

Koushi Tozuka is a notable inventor based in Hanamaki, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Tozuka holds a patent for a semiconductor device and its manufacturing method. This invention includes a semiconductor substrate with first and second main surfaces, featuring a through hole that connects these surfaces. The device is designed with a pad on the first main surface and a through electrode within the through hole. The connection structure includes a direct connection between the pad and the through electrode, as well as an indirect connection. The manufacturing method involves creating an isolation region in the first main surface, forming the pad, and processing the substrate to expose part of the pad.

Career Highlights

Koushi Tozuka is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to focus on advancing semiconductor technologies, contributing to the company's reputation for innovation.

Collaborations

Tozuka has collaborated with notable colleagues, including Atsuko Kawasaki and Kenichiro Hagiwara. Their teamwork has fostered an environment of creativity and innovation within their projects.

Conclusion

Koushi Tozuka's contributions to semiconductor technology exemplify the spirit of innovation. His patent reflects a deep understanding of the complexities involved in semiconductor manufacturing. Through his work at Toshiba and collaborations with talented coworkers, Tozuka continues to influence the field significantly.