Koung Min Ryu

Title: Innovations by Koung Min Ryu

Introduction

Koung Min Ryu is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology. With a total of 2 patents, his work focuses on advanced methods for fabricating semiconductor devices.

Latest Patents

Koung Min Ryu's latest patents include a method for fabricating semiconductor devices. This method involves forming a source/drain pattern on a fin-type pattern, followed by the creation of an etch stop film and an interlayer insulating film. The process continues with the formation of a contact hole in the interlayer insulating film, and the implementation of an ion implantation process while a sacrificial liner is present. The source/drain contact is then connected to the source/drain pattern. Another patent details a semiconductor device featuring a multi-layer contact liner structure. This device includes an active pattern, multiple gate structures, and a source/drain contact, all designed to enhance the performance and reliability of semiconductor devices.

Career Highlights

Koung Min Ryu is currently employed at Samsung Electronics Ltd., a leading company in the technology sector. His work at Samsung has allowed him to contribute to cutting-edge innovations in semiconductor technology.

Collaborations

He has collaborated with notable coworkers such as Kyu-Hee Han and Bong Kwan Baek, further enhancing the innovative environment at Samsung Electronics.

Conclusion

Koung Min Ryu's contributions to semiconductor technology through his patents and work at Samsung Electronics highlight his role as a key innovator in the field. His advancements continue to shape the future of semiconductor devices.