Osaka, Japan

Koujiro Tanaka

This inventor holds 1 USPTO granted patent. Top assignee: Canon Kabushiki Kaisha. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koujiro Tanaka. Retrieved from https://idiyas.com/inventor/koujiro-tanaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovations of Koujiro Tanaka

Introduction

Koujiro Tanaka is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of optical disk technology. His work has led to advancements that enhance the production processes of optical disks.

Latest Patents

Tanaka holds a patent for an "Optical disk master, optical disk substrate stamper, process for production thereof, and magneto-optical recording medium." This innovative process involves forming a photoresist layer on a glass master, cutting the layer by projecting a light beam, and developing the photoresist to create a hollow portion. The process also includes an ion treatment step to decrease the thickness of the photoresist layer at the developed hollow portion.

Career Highlights

Koujiro Tanaka is associated with Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to focus on developing cutting-edge technologies in optical media.

Collaborations

Tanaka has collaborated with notable colleagues such as Masahito Konishi and Keiji Nishikiori. Their teamwork has contributed to the success of various projects within the company.

Conclusion

Koujiro Tanaka's innovative work in optical disk technology has made a lasting impact on the industry. His patent and contributions continue to influence advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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