The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2006
Filed:
Mar. 28, 2002
Masahito Konishi, Kanagawa, JP;
Keiji Nishikiori, Kyoto, JP;
Koujiro Tanaka, Osaka, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A process for producing an optical disk master, comprises the steps of forming a photoresist layer on a glass master, cutting the photoresist layer by projecting light beam onto the glass master having the photoresist layer thereon to expose the photoresist layer to light, developing the photoresist layer after the cutting step to form a hollow portion corresponding to the light-exposed portion, and carrying out an ion treatment by projecting ions onto the developed photoresist layer to decrease the thickness of the photoresist layer at the developed hollow portion to reach the prescribed depth by the ion-treatment.