Company Filing History:
4 out of 3,781 
2 out of 1,268 
Years Active: 2007-2010
Title: Kouji Tange: Innovator in Photomask Technology
Introduction
Kouji Tange is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of photomask technology, holding a total of 4 patents. His work focuses on improving the accuracy and efficiency of photomask production, which is crucial in the semiconductor manufacturing process.
Latest Patents
One of Kouji Tange's latest patents involves a photomask and a method and apparatus for producing the same. This innovation features a shading area with a transmissivity ranging from 0 to 2%, strategically formed at the center of a clear defect in a wiring pattern of a half-tone mask. Adjacent to this shading area, semitransparent regions with a transmissivity of 10 to 25% are created, extending from the inside edge of an imaginary pattern without defects to the outside edge. This design enhances the working accuracy tolerable margin for correcting defects in half-tone masks, thereby improving overall production quality.
Career Highlights
Throughout his career, Kouji Tange has worked with prominent companies such as Renesas Technology Corporation and Toppan Printing Co., Ltd. His experience in these organizations has allowed him to refine his expertise in photomask technology and contribute to advancements in the field.
Collaborations
Kouji Tange has collaborated with several talented individuals, including Yoshikazu Nagamura and Kouki Hayashi. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Kouji Tange's contributions to photomask technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing, making him a valuable figure in the industry.