Kouji Nozaki

Title: Kouji Nozaki: Innovator in Resist Mask Pattern Technology

Introduction

Kouji Nozaki is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of processes for forming resist mask patterns. His innovative work has led to advancements that enhance the efficiency and effectiveness of etching processes in the industry.

Latest Patents

Kouji Nozaki holds a patent for a process for forming a resist mask pattern. This process involves several steps, including the formation of a resist layer made of organic material in a multilevel resist process on a layer to be etched. The method also includes selectively etching a planarizing lower layer used in the resist layer by utilizing an etching gas of oxygen under plasma conditions. Notably, a compound gas containing elements such as boron, silicon, titanium, aluminum, molybdenum, tungsten, and sulfur is added to the etching gas. This innovative approach allows for the deposition of a compound oxide on the sidewalls of the lower layer, forming a protective layer that prevents undercutting during the etching process.

Career Highlights

Kouji Nozaki has had a distinguished career at Fujitsu Corporation, where he has been instrumental in advancing semiconductor technologies. His expertise in resist mask pattern processes has positioned him as a key figure in the field. His work not only contributes to the efficiency of manufacturing processes but also enhances the overall quality of semiconductor devices.

Collaborations

Kouji Nozaki has collaborated with several talented individuals in his field, including Satoru Mihara and Yukari Mihara. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Kouji Nozaki's contributions to the field of semiconductor technology, particularly through his patented process for forming resist mask patterns, highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future advancements in semiconductor manufacturing.