Kouichi Haga

Title: The Innovations of Kouichi Haga

Introduction

Kouichi Haga is a notable inventor based in Shibata, Japan. He is recognized for his contributions to the field of photosensors, particularly through his innovative work with amorphous silicon materials. His expertise has led to advancements that have implications in various technological applications.

Latest Patents

Haga holds a patent for an amorphous silicon photosensor. This invention comprises a photoconductive layer made up of three or four amorphous silicon layers formed on a substrate. Each layer contains at least one kind of atom selected from hydrogen, heavy hydrogen, and halogen atoms. The design features two heterojunctions, with the optical band gap of the amorphous silicon layer between the heterojunctions ranging from 1.6 to 1.8 eV. The first end amorphous silicon layer, which is exposed to light, contains oxygen and has an optical band gap of 1.9 eV or more, while the second end layer, which is not exposed to light, also contains oxygen and has similar properties.

Career Highlights

Throughout his career, Kouichi Haga has worked with prominent companies such as Ricoh Company, Ltd. and Ricoh Research Institute of General Electronics Co., Ltd. His work in these organizations has contributed significantly to the development of advanced electronic components and systems.

Collaborations

Haga has collaborated with notable colleagues, including Akishige Murakami and Hiroshi Miura. These partnerships have fostered innovation and have been instrumental in the advancement of their shared projects.

Conclusion

Kouichi Haga's contributions to the field of amorphous silicon photosensors highlight his innovative spirit and dedication to technological advancement. His work continues to influence the development of electronic devices and systems.