Hamamatsu, Japan

Kosei Fujita

This inventor holds 2 USPTO granted patents. Top assignee: Yamaha Fine Technologies Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kosei Fujita. Retrieved from https://idiyas.com/inventor/kosei-fujita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Kosei Fujita - Innovator in Leak Testing Technology

Introduction

Kosei Fujita is a notable inventor based in Hamamatsu, Japan. He has made significant contributions to the field of leak testing technology. His innovative approach has led to the development of a unique chamber design that accommodates workpieces of various sizes.

Latest Patents

Kosei Fujita holds 1 patent for his invention titled "Chamber, lid, and leak tester." This invention aims to provide a chamber that can effectively position workpieces with openings for leak testing. The design includes a first member with a recess that forms a housing space for the workpiece, a second member that closes the open end of the recess, and a positioning mechanism that ensures the workpiece is held in a predetermined position.

Career Highlights

Fujita is associated with Yamaha Fine Technologies Co., Ltd., where he applies his expertise in developing advanced testing solutions. His work has been instrumental in enhancing the efficiency and accuracy of leak testing processes.

Collaborations

Kosei Fujita has collaborated with talented individuals such as Toru Ishii and Minoru Yamamoto. Their combined efforts have contributed to the advancement of technology in their field.

Conclusion

Kosei Fujita's innovative contributions to leak testing technology exemplify the impact of dedicated inventors in the industry. His work continues to influence the development of efficient testing solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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