This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2014.
Company Filing History:
Years Active: 2014
Title: Koro Nagamine: Innovator in Semiconductor Technology
Introduction
Koro Nagamine is a prominent inventor based in Oita, Japan. She has made significant contributions to the field of semiconductor technology. Her innovative work has led to the development of a unique semiconductor device and its manufacturing method.
Latest Patents
Koro Nagamine holds a patent for a semiconductor device and the manufacturing method of this device. According to one embodiment, her invention includes a semiconductor substrate, a metal film, a surface modifying layer, and a redistribution trace. On the semiconductor substrate, a wire and a pad electrode are formed. The metal film is created over the semiconductor substrate, while the surface modifying layer enhances adhesion with a resist pattern. The redistribution trace is formed on the metal film via the surface modifying layer. This patent showcases her expertise and creativity in semiconductor design.
Career Highlights
Koro Nagamine is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. Her role at Toshiba has allowed her to work on cutting-edge projects and contribute to advancements in semiconductor technology. Her dedication and innovative spirit have made her a valuable asset to her team.
Collaborations
Koro Nagamine has collaborated with notable colleagues, including Soichi Yamashita and Hirokazu Ezawa. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Koro Nagamine's contributions to semiconductor technology exemplify her innovative spirit and dedication to her field. Her patent and work at Toshiba highlight her role as a leading inventor in Japan.