Koon Lay Tan

Title: Innovations by Koon Lay Tan in MOSFET Technology

Introduction

Koon Lay Tan is a notable inventor based in Singapore, recognized for his contributions to semiconductor technology. He has developed a significant patent that addresses process improvements in self-aligned polysilicon MOSFET technology. His work has implications for enhancing the reliability and efficiency of semiconductor devices.

Latest Patents

Koon Lay Tan holds a patent for a process that utilizes silicon enriched silicon oxynitride. This innovation serves dual purposes as an independent etch stop and as a cap layer and sidewall component over polysilicon gate electrodes. The technology aims to prevent insulator thinning and shorts that can occur due to misaligned contact masks. In one embodiment, a silicon enriched silicon oxynitride layer is strategically placed over a polysilicon gate with conventional sidewalls and an insulative cap. This design minimizes the risk of etching contact openings in the insulative layer, thereby enhancing the overall integrity of the semiconductor device.

Career Highlights

Koon Lay Tan is associated with Chartered Semiconductor Manufacturing Ltd, a prominent corporation in the semiconductor industry. His work has contributed to advancements in MOSFET technology, showcasing his expertise and innovative approach in the field.

Collaborations

Throughout his career, Koon Lay Tan has collaborated with esteemed colleagues such as Mei Sheng Zhou and Sheau-Tan Loong. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Koon Lay Tan's contributions to semiconductor technology, particularly in MOSFET advancements, highlight his role as a key inventor in the field. His innovative patent demonstrates a commitment to improving the efficiency and reliability of semiconductor devices.