Suwon-si, South Korea

Kolake Mayya Subramanya


Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 8(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2008)
  • Suwon-si, KR (2010 - 2012)

Company Filing History:


Years Active: 2008-2012

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3 patents (USPTO):

Title: Innovations of Kolake Mayya Subramanya

Introduction

Kolake Mayya Subramanya is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor device fabrication. With a total of three patents to his name, his work is recognized for its innovative approaches and technical advancements.

Latest Patents

His latest patents include a mask pattern for semiconductor device fabrication, a method of forming the same, and a method of fabricating finely patterned semiconductor devices. These patents provide a mask pattern that includes a silicon-containing self-assembled molecular layer. The method involves forming a resist pattern on a semiconductor substrate, where the self-assembled molecular layer is created on the resist pattern. This layer features a silica network formed through a sol-gel reaction. The process begins with the formation of a resist pattern that exposes the underlayer to a first width. Subsequently, the self-assembled molecular layer is selectively formed on the resist pattern's surface, exposing the underlayer to a second width that is smaller than the first. The underlayer is then etched using both the resist pattern and the self-assembled molecular layer as an etching mask to achieve a fine pattern.

Career Highlights

Kolake Mayya Subramanya is currently employed at Samsung Electronics Co., Ltd. His work at this leading technology company has allowed him to push the boundaries of semiconductor technology. His innovative methods have the potential to enhance the efficiency and performance of semiconductor devices.

Collaborations

He collaborates with talented coworkers, including Jung-hwan Hah and Jin Kuk Hong. Their combined expertise contributes to the advancement of semiconductor technologies and innovations.

Conclusion

Kolake Mayya Subramanya's contributions to semiconductor device fabrication exemplify the spirit of innovation in technology. His patents reflect a commitment to advancing the field and improving device performance.

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