Koki Nishimuko is an accomplished inventor based in Kikuchi-gun, Japan, known for his significant contributions to substrate processing methods and apparatuses. With a total of five patents to his name, Koki has played a vital role in advancing technologies used in the semiconductor industry.

Latest Patents

Two of Koki Nishimuko's notable inventions include a substrate processing method and a resist pattern forming method. Both patents focus on utilizing a coating and developing apparatus along with an aligner to form a resist film on a substrate that has a base film and a base pattern. The process involves inspecting multiple measurement items, such as reflection ratios, film thickness, line widths after development, and the accuracy of the matching between the base and resist patterns. By selecting parameters for amendment based on corresponding data from these measurements, the workload on operators is significantly reduced while ensuring proper amendments are made.

Career Highlights

Koki Nishimuko is affiliated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment sector. His work has contributed to enhancing the efficiency and reliability of processes involved in producing semiconductor devices.

Collaborations

Throughout his career, Koki has collaborated with notable coworkers, including Kunie Ogata and Hiroshi Tomita. Their combined expertise fosters an innovative environment that drives the development of cutting-edge technologies in substrate processing.

Conclusion

Koki Nishimuko's inventive spirit and dedication to improving substrate processing techniques have placed him at the forefront of innovation in the semiconductor industry. His contributions are pivotal in paving the way for advancements that enhance manufacturing efficiency and reduce operational complexities.

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