Company Filing History:
Years Active: 2023-2025
Title: Koki Mukaiyama: Innovator in Plasma Processing Technology
Introduction
Koki Mukaiyama is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing, holding 2 patents that showcase his innovative approaches to substrate processing.
Latest Patents
Mukaiyama's latest patents include a plasma processing method and a plasma processing system. The plasma processing method involves a sophisticated technique performed in a plasma processing apparatus with a chamber. This method includes providing a substrate with a film stack that consists of a silicon oxide film and a silicon nitride film. The process entails forming a plasma from a processing gas containing HF gas and at least one of CF gas and phosphorus-containing gas to etch the film stack. The substrate support is controlled to a temperature between 0° C. and 70° C., while a bias RF signal of 10 kW or more or a bias DC signal of 4 kV or more is supplied to the substrate support.
Another notable patent is the substrate processing method, which includes disposing a substrate on a substrate support within a chamber. This method involves supplying a processing gas that includes hydrogen fluoride gas into the chamber. The temperature and pressure of the hydrogen fluoride gas are meticulously controlled to achieve optimal processing conditions.
Career Highlights
Koki Mukaiyama is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this esteemed organization has allowed him to develop and refine his innovative techniques in plasma processing.
Collaborations
Mukaiyama has collaborated with notable coworkers, including Satoshi Ohuchida and Maju Tomura. Their combined expertise has contributed to advancements in the field of plasma processing technology.
Conclusion
Koki Mukaiyama's contributions to plasma processing technology through his patents and work at Tokyo Electron Limited highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of substrate processing.