Company Filing History:
Years Active: 2018
Title: Koki Kanno: Innovator in Zinc Oxide Sputtering Technology
Introduction
Koki Kanno is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering targets for transparent conductive films. His innovative work has implications for various applications in electronics and optoelectronics.
Latest Patents
Kanno holds a patent for a zinc oxide sputtering target. This invention is designed to improve the film formation rate while minimizing arcing during the creation of zinc oxide-based transparent conductive films through sputtering. The zinc oxide-based sputtering target consists of a sintered body primarily made of zinc oxide crystal grains. It features a degree of (002) orientation of 50% or greater at the sputtering surface and a density of 5.30 g/cm³ or greater. This patent highlights Kanno's expertise in enhancing the efficiency and quality of film deposition processes.
Career Highlights
Koki Kanno is associated with NGK Insulators, Inc., a company known for its advanced materials and technologies. His work at NGK has allowed him to focus on innovative solutions that address industry challenges. Kanno's dedication to research and development has positioned him as a key figure in his field.
Collaborations
Kanno has collaborated with notable colleagues such as Jun Yoshikawa and Katsuhiro Imai. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Koki Kanno's contributions to the field of sputtering technology exemplify the impact of innovative thinking in materials science. His patent for a zinc oxide sputtering target showcases his commitment to improving film formation processes. Kanno's work continues to influence advancements in transparent conductive films and related applications.