The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2018
Filed:
Sep. 09, 2015
Applicant:
Ngk Insulators, Ltd., Nagoya-Shi, JP;
Inventors:
Jun Yoshikawa, Nagoya, JP;
Katsuhiro Imai, Nagoya, JP;
Koichi Kondo, Nagoya, JP;
Koki Kanno, Nagoya, JP;
Assignee:
NGK Insulators, Ltd., Nagoya, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01G 9/00 (2006.01); C01G 9/02 (2006.01); C04B 35/453 (2006.01); C23C 14/08 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
C01G 9/02 (2013.01); C04B 35/453 (2013.01); C23C 14/086 (2013.01); C23C 14/3407 (2013.01); C23C 14/3414 (2013.01); C01P 2002/90 (2013.01); C01P 2004/20 (2013.01); C01P 2004/54 (2013.01); C01P 2004/61 (2013.01); C01P 2004/62 (2013.01); C01P 2006/10 (2013.01); C01P 2006/80 (2013.01); C04B 2235/322 (2013.01); C04B 2235/3284 (2013.01); C04B 2235/5445 (2013.01); C04B 2235/6025 (2013.01); C04B 2235/77 (2013.01); C04B 2235/787 (2013.01); C04B 2235/788 (2013.01);
Abstract
Provided is a zinc oxide-based sputtering target capable of improving the film formation rate while suppressing arcing in the formation of a zinc oxide-based transparent conductive film by sputtering. This zinc oxide-based sputtering target includes a zinc oxide-based sintered body mainly including zinc oxide crystal grains, and has a degree of (002) orientation of 50% or greater at a sputtering surface and a density of 5.30 g/cmor greater.