Yamatokouriyama, Japan

Koji Sumi


Average Co-Inventor Count = 5.5

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2005-2008

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2 patents (USPTO):Explore Patents

Title: The Innovations of Koji Sumi

Introduction

Koji Sumi is a notable inventor based in Yamatokouriyama, Japan. He has made significant contributions to the field of substrate drying technology, holding two patents that showcase his innovative approach to improving processing methods.

Latest Patents

Sumi's latest patents include a "Method and device for drying substrate." This invention features a device designed for drying substrates, which includes a processing vessel that houses a specified number of substrates, such as semiconductor wafers, installed in parallel. The device incorporates a first substrate supporting member, a processing fluid supplying section, and a processing fluid exhausting section. Additionally, it has a drying fluid supplying section that delivers liquid drops of drying fluid for effective drying processing on the substrates. Another patent under his name is also titled "Method and device for drying substrate." This device stores multiple substrates and features a processing container where cleaning fluid is drained after cleaning the substrates. It includes an injection nozzle for smoothly feeding drying fluid, thereby eliminating or simplifying the need for exhaust equipment.

Career Highlights

Throughout his career, Koji Sumi has worked with prominent companies, including Daikin Industries, Ltd. and Toho Kasei Ltd. His experience in these organizations has contributed to his expertise in developing innovative drying technologies.

Collaborations

Sumi has collaborated with notable coworkers, including Norio Maeda and Hiroshi Aihara. Their combined efforts have likely enhanced the development and implementation of his innovative ideas.

Conclusion

Koji Sumi's contributions to substrate drying technology reflect his dedication to innovation and improvement in processing methods. His patents demonstrate a commitment to advancing the field and improving efficiency in substrate handling.

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