Koji Ogura

Title: Koji Ogura: Innovator in Substrate Processing Technology

Introduction

Koji Ogura is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 2 patents. His work focuses on improving the efficiency and effectiveness of substrate processing methods.

Latest Patents

Ogura's latest patents include a substrate processing apparatus and a substrate processing method. The substrate processing apparatus features a processing container that immerses the substrate in a processing liquid. It also includes a mixing device that combines a phosphoric acid aqueous solution with an additive to create a mixed liquid for processing. The controller of the apparatus regulates the phosphoric acid concentration, ensuring optimal processing conditions. Additionally, his patent on the substrate processing method and recording medium aims to shorten etching processing times, utilizing a substrate processing tub and a mixing unit to enhance the efficiency of the etching process.

Career Highlights

Koji Ogura is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative work has contributed to advancements in substrate processing technologies, making significant impacts in the field.

Collaborations

Ogura has collaborated with notable coworkers, including Hiroshi Yoshida and Keita Hirase, who have also contributed to advancements in substrate processing technologies.

Conclusion

Koji Ogura's contributions to substrate processing technology through his patents and work at Tokyo Electron Limited highlight his role as an influential inventor in the industry. His innovations continue to shape the future of substrate processing methods.