Koji Ato is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing and polishing devices. With a total of 5 patents to his name, Ato's work has had a considerable impact on the technology used in semiconductor manufacturing and other related industries.

Latest Patents

Ato's latest patents include a polishing device and a substrate processing device. The polishing apparatus features multiple polishing units equipped with moving mechanisms that allow for the movement of top rings between various polishing positions and wafer receiving/delivering positions. Additionally, linear transporters facilitate the transfer of wafers between these positions. The second patent focuses on a method and apparatus for polishing substrates, such as semiconductor wafers and glass substrates, to achieve a flat mirror finish. This process includes a cleaning section that effectively removes particles and metal ions from the polished substrate.

Career Highlights

Koji Ato has built a successful career at Ebara Corporation, where he has been instrumental in developing advanced polishing technologies. His innovative approaches have not only improved the efficiency of substrate processing but have also enhanced the quality of the final products.

Collaborations

Throughout his career, Ato has collaborated with notable colleagues, including Hiroshi Sotozaki and Kenya Ito. These partnerships have fostered a creative environment that has led to the development of cutting-edge technologies in the field.

Conclusion

Koji Ato's contributions to the field of substrate processing and polishing devices highlight his innovative spirit and dedication to advancing technology. His patents and work at Ebara Corporation continue to influence the industry significantly.

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